J. Roh, H. J. Yun, V. Klimov, “High ON-current vertical field-effect transistors based on environmentally-benign quantum dots”, Materials Research Society (MRS) spring meeting, phoenix, USA (Apr, 2018). Oral presentation.

J. Roh, Y.-S. Park, J. Lim, V. Klimov, “Low-threshold optically pumped lasing in LED-like stacks based on colloidal quantum dots”, Materials Research Society (MRS) spring meeting, phoenix, USA (Apr, 2018). Oral presentation.

J. Roh, H. J. Yun, V. Klimov, “High ON-Current Vertical Quantum Dot Transistors as a Novel Platform for Flexible and Wearable Electronics”, Materials Research Society (MRS) fall meeting, Boston, USA (Nov, 2018). Oral presentation.

J. Roh, H. J. Yun, V. I. Klimov, “High ON-current quantum dot transistors employing a vertical architecture”, Conference on Excited State Processes in Electronic and Bio Nanomaterials, Santa Fe, USA (Jun, 2018). Best Poster Presentation Award

J. Roh, J. Lim, Y.-S. Park, and V. I. Klimov, “Nano-patterning by interferometric lithography for optoelectronic devices”, Center for Advanced Solar Photophysics (CASP) workshop, Los Alamos, USA (Jul, 2017)

J. Roh, J. Song, J. Kim, and C. Lee, “Investigating light-induced degradation of amorphous polymers by employing transistor structure”, International Conference of Synthetic Metal (ICSM), Guangzhou, China (Jun, 2016).

J. Roh, I.-T. Cho, J.-H. Lee, S. H. Jin, and C. Lee, “Bias-stress-induced instability of multilayer molybdenum disulfide field-effect transistors”, Materials Research Society (MRS) spring meeting, Phoenix, USA (Mar, 2016).

J. Roh, H. Kim, and C. Lee, “Surface modification effect of SiO2 dielectric on operational stability using buffer layer with various polarity in organic thin film transistors”, International Conference on Advanced Electromaterials (ICAE), Jeju, Korea (Nov, 2015).

J. Roh, I.-T. Cho, H. Shin, B. H. Hong, J.-Ho Lee, S. H. Jin, and C. Lee, “Highly stable hysteresis-free molybdenum disulfide field-effect transistors”, International Meeting on Information Display (IMID), Daegu, Korea (Aug, 2015). Oral presentation, selected as an IMID 2015 awardee for KIDS awards gold (1st prize).

J. Roh, H. Kim, H. Shin, H. Roh, J. Kwak, B. J. Jung, and C. Lee, “Effect of alkyl chain length of self-assembled monolayer on bias stability of organic thin film transistors”, International Symposium on Flexible Organic Electronics (ISFOE), Thessaloniki, Greece (Jul, 2015).

J. Roh, C.-m. Kang, H. Shin, J. Kwak, B. J. Jung, and C. Lee, “Semiconductor-insulator interface engineering using self-assembled monolayer for organic field-effect transistors”, International Meeting on Information Display (IMID), Daegu, Korea (Aug, 2014). Oral presentation.

J. Roh, C.-m. Kang, H. Shin, J. Kwak, B. J. Jung, and C. Lee, “Semiconductor-dielectric interface engineering for organic transistors using self-assembled monolayer”, UK-KOREA Workshop on Plastic Electronics, Seoul, Korea (Jul, 2014). Oral presentation.

J. Roh, C.-mo Kang, H. Shin, J. Kwak, B. J. Jung, and C. Lee, “n-type organic thin film transistors with high operational stability”, Society for Information Display (SID) Display Week, San Diego, USA, (Jun, 2014).

J. Roh, J. Lee, C.-m. Kang, B. J. Jung, and C. Lee, “Improved electrical performance and operational stability through interface engineering for organic thin film transistors”, German-Korean Polymer Symposium, Hamburg, Germany (Aug, 2013). Invited talk.

J. Roh, C.-m. Kang, H. Shin, J. Kwak, B. J. Jung, and C. Lee, “The effect of surface polarity of gate dielectric buffer layer on operational stability in organic thin film transistors”, Society for Information Display (SID) Display Week, Vancouver, Canada (May, 2013).

J. Roh, C.-m. Kang, J. Kwak, B. J. Jung, and C. Lee, “Improved electrical performance and operational stability of organic thin film transistors by modifying insulator surface using low-k polymers”, Materials Research Society (MRS) fall meeting, Boston, USA (Nov, 2012).

J. Roh, C.-m. Kang, J. Kwak, B. J. Jung, and C. Lee, “Pentacene thin film transistors on fluorinated self-assembled monolayer-treated gate insulator and their gate bias stress effect”, International workshop on flexible and printable electronics (IWFPE), Muju, Korea (Nov, 2012)

J. Roh, M. Park, C.-m. Kang, H. Cho, and C. Lee, “Enhanced performance of all-solution-processed n-type organic thin film transistor by employing self-assembled monolayer”, International Meeting on Information Display (IMID), Goyang, Korea (Oct, 2011).